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Dr. Jing Zhang Awarded NSF Grant for High-Tech Nanofabrication Equipment

Dr. Jing Zhang Awarded NSF Grant for High-Tech Nanofabrication Equipment

Jing Zhang, engineering faculty member at Rochester Institute of Technology, received a $305,000 grant from the National Science Foundation to acquire a new etching system for photonic, electronic and bio-device fabrication. The system strengthens RIT’s fabrication capability in its Semiconductor & Microsystems Fabrication Laboratory to support new and existing multidisciplinary research in science and engineering, to enable educational curriculum development, and be used for workforce development and training activities led by RIT’s engineering college.

The ICP-RIE system—an inductively coupled plasma reactive ion etching system—is equipment used to create specific structural patterns, or to expose different conductive layers, on the integrated circuits found in electronic devices, said Zhang.

To read more about Dr. Zhang's research, please visit the University News.